高温存储对Sn-Pb-Ni凸点界面金属间化合物生长的影响
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作者单位:

北京微电子技术研究所封装测试中心,北京,100076

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通讯作者:

文惠东,男,工程师,E-mail:wenhuidong@yeah.net。

中图分类号:

O781

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IMC Formation of Sn-Pb-Ni Bumps in High Temperature Storage
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Affiliation:

Department of Packaging and Testing, Beijing Microelectronics Technology Institution, Beijing, 100076, China

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    摘要:

    倒装焊工艺由于具有信号处理速度快、封装密度高、可靠性高等特点,已广泛应用于高密度集成电路封装工艺中。高可靠倒装焊器件的互连焊点通常采用10Sn90Pb等高铅焊料,该焊料具有剪切强度高、可靠性高等优点,但其熔点高、回流工艺窗口窄等特性给封装工艺带来一定难度,此外该焊料在高温存储环境的可靠性有待进一步提高。本文采用Ni元素对10Sn90Pb焊料进行改性,研究高温存储下Sn-Pb-Ni体系凸点的力学性能以及金属间化合物(Intermetallic compound,IMC)的生长演变规律,以此评估Ni元素对10Sn90Pb凸点可靠性的影响。主要结果如下:适量添加Ni元素可以细化10Sn90Pb焊点界面处IMC晶粒,降低高温存储条件下的IMC生长速度,但在一定程度上会降低凸点的剪切强度。0.05%~0.1%含量的Ni元素添加对10Sn90Pb凸点综合性能提升较为显著。

    Abstract:

    The flip-chip method has been widely used in high-density integrated circuit package due to its fast signal processing speed, high package density and high reliability. 10Sn90Pb is usually adopt as solder joint in high reliable flip-chip devices, which has the advantage of higher shear strength and higher reliability, however, its high melting point, narrow reflow process window and other characteristics bring a certain degree of difficulties to the package. In addition, the reliability of the solder in high temperature storage environment needs to be further improved. Ni is used to modify 10Sn90Pb bump, the mechanical property of Sn-Pb-Ni bump and growth rhythm of intermetallic compound (IMC) in high temperature storage is analyzed, thus, the influence of Ni to 10Sn90Pb bump reliability is assessed. The main results are as follows: Addition of proper amount of Ni can refine the IMC grains at the interface of 10Sn90Pb solder joint and reduce the growth rate of IMC under high temperature storage condition, but it also, to a certain extent, reduces the shear strength of bump, 0.05%—0.1% Ni will significantly improve performance of the bumps.

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引用本文

文惠东,黄颖卓,林鹏荣,练滨浩.高温存储对Sn-Pb-Ni凸点界面金属间化合物生长的影响[J].南京航空航天大学学报,2019,51(S1):33-37

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  • 收稿日期:2019-04-09
  • 最后修改日期:2019-06-20
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  • 在线发布日期: 2019-10-22
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