衬底温度对共溅射法制备的Cu2ZnSnS4薄膜晶粒生长的影响
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Effect of Substrate Temperature on Grain Growth of Cu2ZnSnS4 Thin Film Prepared by Co-sputtering Method
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    摘要:

    研究了衬底温度对采用Cu2ZnSnS4靶和Cu靶共溅射制备的Cu2ZnSnS4薄膜晶粒生长的影响。采用拉曼光谱、X射线能量色散谱仪、扫描电子显微镜和紫外可见近红外分光光度计对在不同衬底温度条件下制备的Cu2ZnSnS4薄膜 的元素比例、形貌以及光学带隙进行了表征与分析。结果表明制备的Cu2ZnSnS4薄膜晶粒生长遵循不同规律。室温衬底条件下制备的Cu2ZnSnS4薄膜晶粒生长遵循两步法,导致颗粒尺寸和元素分布不均;而在120~200 ℃衬底温度条件下制备的Cu-Zn-Sn-S预置层在溅射过程中已有Cu2ZnSnS4晶粒形成,这些晶粒在后续硫化生长过程中起到形核点的作用, 促进了Cu2ZnSnS4晶粒的长大与元素的均匀分布。随着衬底温度的升高,Cu-Zn-Sn-S预置层及由此制备出的Cu2ZnSnS4薄膜的结晶性变好,Cu2ZnSnS4薄膜的带隙先升高后减小至1.55 eV。

    Abstract:

    The effect of substrate temperature on the grain growth of Cu2ZnSnS4 thin film prepared by co-sputtering of Cu2ZnSnS4and Cu targets is studied. The chemical composition, morphology and band gap of Cu2ZnSnS4 thin films are characterized by Raman, energy dispersive spectrometer(EDS), scanning electron on icroscope (SEM) and UV -Vis-NIR spectrometer, respectively. The results show that the formation of Cu2ZnSnS4 thin film follows different mechanisms. When the substrate is under room temperature, the growth of Cu2ZnSnS4 grains follows the two-step mechanism, leading to the inhomogeneous distributions of particles and element of Cu2ZnSnS4 thin film. However, Cu2ZnSnS4 grains appear during the co-sputtering process in Cu-Zn-Sn-S precursor at substrate temperature from 120—200 ℃, which act as nucleation seeds to promote the growth and homogeneous distribution of Cu2ZnSnS4 grains in the post sulfurization process. With increasing substrate temperature, the crystallinity of Cu-Zn-Sn-S precursor and Cu2ZnSnS4 thin film becomes better, and the band gap of Cu2ZnSnS4 thin films first increases then decreases to 1.55 eV.

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李金泽 沈鸿烈 姚函妤 杨楠楠李玉芳 吴斯泰.衬底温度对共溅射法制备的Cu2ZnSnS4薄膜晶粒生长的影响[J].南京航空航天大学学报,2016,48(1):42-47

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  • 在线发布日期: 2016-03-16
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